A professional-grade recovery mask infused with PDRN, centella, and hyaluronic acid to instantly calm, hydrate, and replenish the skin post-treatment. Ideal for use after laser, peels, or skin needling.
How to Use
Apply mask to clean skin. Leave on for 15–20 minutes, then remove and pat in remaining essence. Use as needed post-treatment or weekly.
Best For
Redness and irritation
Post-procedure or inflamed skin
Deep hydration and barrier support
Ingredients
Key ingredients include PDRN, centella asiatica extract, allantoin, and hyaluronic acid. Refer to box for full INCI list.
